中国 多孔質SiC メーカー、サプライヤー、工場


VeTek semiconductor is a leading manufacturer of Porous SiC ceramics for the semiconductor industry. Passed ISO9001, VeTek Semiconductor has good control on quality. VeTek Semiconductor has always been committed to becoming an innovator and leader in the porous SiC ceramic industry.


Porous SiC Ceramic Disc

Porous SiC Ceramic Disc


Porous SiC ceramics are ceramic material that are fired at high temperatures and have a large number of interconnected or closed pores inside. It is also known as a microporous vacuum suction cup, with pore sizes ranging from 2 to 100um.


Porous SiC ceramics have been widely used in metallurgy, chemical industry, environmental protection, biology, semiconductor and other fields. Porous SiC ceramics can be prepared by foaming method, sol gel method, tape casting method, solid sintering method and impregnation pyrolysis method.


Preparation of porous SiC ceramics by sintering method

Preparation of porous SiC ceramics by sintering method

Compressive strength of Porous SiC ceramicsFlexural strength of Porous SiC ceramicsFracture toughness of Porous SiC ceramicsthermal conductivity ofPorous SiC ceramics

Properties of porous silicon carbide ceramics prepared by different methods as a function of porosity



porous SiC ceramics Suction Cups in Semiconductor Wafer Fabrication

porous SiC ceramics Suction Cups in Semiconductor Wafer Fabrication


VeTek Semiconductor's porous SiC ceramics play the role of clamping and carrying wafers in semiconductor production. They are dense and uniform, high in strength, good in air permeability, and uniform in adsorption.


They effectively address many difficult problems such as wafer indentation and chip electrostatic breakdown, and help achieve the processing of extremely high-quality wafers.

Working diagram of porous SiC ceramics:

Working diagram of porous SiC ceramics


Working principle of porous SiC ceramics: The silicon wafer is fixed by the vacuum adsorption principle. During processing, the small holes on the porous SiC ceramics are used to extract the air between the silicon wafer and the ceramic surface, so that the silicon wafer and the ceramic surface are at low pressure, thereby fixing the silicon wafer.


After processing, plasma water flows out of the holes to prevent the silicon wafer from adhering to the ceramic surface, and at the same time, the silicon wafer and the ceramic surface are cleaned.


Microstructure of the porous SiC ceramics

Microstructure of the porous SiC ceramics


Highlight advantages and features:


●High temperature resistance

●Resistance to wear

●Chemical resistance

●High mechanical strength

●Easy to regenerate

●Excellent thermal shock resistance


item
unit
porous SiC ceramics
Pore diameter
um
10~30
Density
g/cm3
1.2~1.3
Surface roughness
um
2.5~3
Air absorption value
KPA
-45
Flexural strength
MPa
30
Dielectric constant
1MHz
33
Thermal conductivity
W/(m·K)
60~70

There are several high requirements for porous SiC ceramics:


1. Strong vacuum adsorption

2. Flatness is very important, otherwise there will be problems during operation

3. No deformation and no metal impurities


Therefore, the Air absorption value of VeTek Semiconductor's porous SiC ceramics reaches -45KPA. At the same time, they are tempered at 1200℃ for 1.5 hours before leaving the factory to remove impurities and are packaged in vacuum bags.


Porous SiC ceramics are widely used in wafer processing technology, transfer and other links. They have made great achievements in bonding, dicing, mounting, polishing and other links.


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多孔質SiC真空チャック

多孔質SiC真空チャック

中国の多孔質 SiC 真空チャックの専門メーカーおよびサプライヤーとして、Vetek Semiconductor の多孔質 SiC 真空チャックは、特に CVD および PECVD プロセスに関して、半導体製造装置の主要コンポーネントに広く使用されています。 Vetek Semiconductor は、高性能多孔質 SiC 真空チャックの製造と供給を専門としています。さらにお問い合わせをお待ちしております。

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多孔質セラミック真空チャック

多孔質セラミック真空チャック

中国の多孔質セラミック真空チャックの専門メーカーおよびサプライヤーとして、Vetek Semiconductor の多孔質セラミック真空チャックは、優れた高温耐性、化学的安定性、機械的強度を備えた炭化ケイ素セラミック (SiC) 材料で作られています。半導体製造プロセスに欠かせないコア部品です。さらにお問い合わせをお待ちしております。

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多孔質SiCセラミックチャック

多孔質SiCセラミックチャック

Vetek Semiconductor は、ボンディング、スクライビング、​​パッチ、研磨およびその他のリンク、レーザー加工に適した、ウェーハ処理技術、搬送およびその他のリンクで広く使用される多孔質 SiC セラミック チャックを提供しています。当社の多孔質SiCセラミックチャックは、超強力な真空吸着力、高い平坦性、高純度を備え、ほとんどの半導体産業のニーズを満たします。お問い合わせを歓迎します。

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